The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2004
Filed:
Mar. 12, 2002
Alan L. Wertheimer, Pittsford, NY (US);
John J. Hannon, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method is taught for measuring magnification of an afocal optical system. The method comprises the steps of directing a collimated light beam through the afocal optical system; intercepting the collimated beam exiting the afocal optical system with a prism; generating two reflected return beams at a first angle therebetween with the prism; passing the two reflected return beams through the afocal optical system; observing an interference pattern created by the two reflected return beams after exiting the afocal optical system; measuring a spacing between at least two fringes of the interference pattern; determining a second angle between the two reflected return beams exiting the afocal optical system using the spacing of the at least two fringes of the interference pattern; and comparing the second angle between the two reflected return beams exiting the afocal optical system to the first angle between the two reflected return beams immediately exiting the prism to thereby measure the magnification of the afocal optical system.