The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 2004

Filed:

Jun. 28, 2002
Applicant:
Inventor:

Yoshiaki Oku, Kyoto, JP;

Assignee:

Rohm Co., Ltd., Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/976 ;
U.S. Cl.
CPC ...
H01L 2/976 ;
Abstract

In an FET having an MFMIS structure in which a floating gate, a ferroelectric layer and a control gate are sequentially provided through a gate insulating film on the surface of a source—drain region formed on the surface of a semiconductor substrate, the ferroelectric layer is constituted by an inorganic film having a vacancy rate of 50% or more.


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