The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2004
Filed:
Sep. 12, 2002
Guenter Schoeppe, Kunitz, DE;
Carl Zeiss Jena GmbH, Jena, DE;
Abstract
Arrangement and method for focus monitoring in a microscope with digital image generation, preferably in a confocal microscope. The arrangement provides an additional, rotatably supported transparent optical component in the known construction of a microscope in front of a main beam splitter arranged in the beam path in the area of a parallel illumination beam path. According to the method, the images required for focus monitoring are recorded with a transparent optical component inclined by angle +&agr; or −&agr;. The images are checked for correlation of the image contents in the direction of beam displacement by pixel-by-pixel displacement. The determined displacement &Dgr;s at optimum correlation represents a measurement of the instantaneous focusing or defocusing. The suggested solution for focus monitoring is applicable with slight adaptations for all microscopes outfitted with digital image-generating methods and arrangements. In confocal microscopes, applicability to defocusing is limited in a range of about 5 to 8×&lgr;/NA .