The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2004
Filed:
Nov. 08, 2001
Chun-Wei Lin, Taichung, TW;
Epitech Inc., Taichung, TW;
Abstract
A fabric structure is constructed having a fabric base sheet, a viscidity layer, a polymeric back layer, and a protective layer. The polymeric back layer is prepared from SBC (styrenic block copolymer) for the advantage of low specific gravity and preventing the drawback of PVC or the like that pollutes the environment when disposed off. The protective layer is prepared from PU series or modified SBC (styrenic block copolymer) series agent. When the fabric structure used to make a bag, the front surface of the fabric base sheet is disposed outside the bag and the surface of the protective layer is disposed inside the bag.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile