The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2004
Filed:
May. 13, 2002
Applicant:
Inventors:
Harry Dietrich, Kirchardt, DE;
Volker Dudek, Korntal-Muenchingen, DE;
Andreas Schueppen, Lauffen, DE;
Assignee:
Atmel Germany GmbH, Heilbronn, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/130 ;
U.S. Cl.
CPC ...
H01L 2/130 ;
Abstract
In a method for manufacturing a silicon wafer with an insulating intermediate layer, the surface of a first wafer, which has an insulating intermediate layer, is bonded to the surface of a second wafer, and then the substrate layer and the insulating intermediate layer of the fist wafer are removed. The new silicon surface created in this manner has a high layer quality which is achieved at a low cost.