The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2004
Filed:
Sep. 28, 2001
Erik Cho Houge, Orlando, FL (US);
John Martin McIntosh, Orlando, FL (US);
Larry E. Plew, St. Cloud, FL (US);
Agere Systems, Inc., Allentown, PA (US);
Abstract
A system and method of metrology ( ) whereby a three dimensional shape profile is defined ( ) for a surface feature on a substrate by applying ( ) a transform function F(x) to an image intensity map I(x,y) obtained ( ) by inspecting the substrate with a scanning electron microscope ( ). The transform function F(x) is developed ( ) by correlating the image intensity map of a first wafer ( ) to a height vector ( ) obtained by inspecting the first wafer with a more accurate metrology tool, for example a stylus nanoprofilometer ( ). A simple ratio-based transform may be used to develop F(x). An asymmetric multiple parameter characterization of the three dimensional shape profile may be developed ( ) by plotting critical space and width dimensions (S , S , W , W ) from a vertical axis (C—C) as a function of height of the feature.