The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2004
Filed:
Feb. 28, 2000
Raymond Browning, San Carlos, CA (US);
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Control for a production line that queues work-in-process (WIP) prior to a re-entrant bottleneck processing node, such as a photolithography device in a semi-conductor fabrication line. For each WIP, a determination is made as to whether a cleared trajectory is available through all processing nodes subsequent to the bottleneck processing node and back to the re-entrant node or to exit of the production line. If a cleared trajectory is available, the subsequent processing nodes are reserved for the WIP. The WIP is then injected into the process flow, with the result that secondary bottlenecks at downstream processing nodes are largely avoided because the nodes have been pre-reserved. If a cleared trajectory for more than one WIP is available, selection of one WIP for injection into the workflow can be made based on a queuing or priority based selection process.