The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2004
Filed:
Jun. 11, 1999
Applicant:
Inventors:
Akiyoshi Suzuki, Tokyo, JP;
Minoru Yoshii, Tokyo, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G01B 1/100 ; G01N 2/186 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G01B 1/100 ; G01N 2/186 ;
Abstract
A wafer having a plurality of areas is subjected to multiple exposures or a stitching exposure with a plurality of mask patterns being interchanged. A plurality of wafers are sequentially exposed to the plurality of mask patterns, with one wafer being replaced with a next wafer. When the one wafer is replaced with the next wafer, the next wafer is exposed to the mask pattern last used, prior to the replacement. When one mask pattern is interchanged with a next mask pattern, an area of the one wafer, last exposed to the one mask pattern, is first exposed to the next mask pattern.