The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2004
Filed:
Jun. 19, 2000
Applicant:
Inventors:
Bernd Aldefeld, Hamburg, DE;
Johannes Adrianus Overweg, Germany, DE;
Assignee:
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V 3/00 ;
U.S. Cl.
CPC ...
G01V 3/00 ;
Abstract
The invention relates to an MR method wherein disturbing MR signals from peripheral regions outside the isocenter are suppressed in that a location-dependent, brief, steady magnetic field is produced simultaneously with an RF pulse. When the field strength of the magnetic field in the peripheral regions is either larger or smaller than that at the isocenter, it can be achieved that exclusively the nuclear magnetization in the peripheral regions is excited, which magnetization can subsequently be dephased. The subsequent MR sequence then influences only the region around the isocenter.