The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2004
Filed:
Oct. 30, 2001
Nobutaka Kitagawa, Machida, JP;
Ken Tanabe, Kawasaki, JP;
Kabushiki Kaisha Toshiba, , JP;
Abstract
A semiconductor integrated circuit system includes first and second semiconductor devices formed on a substrate and required to have properties the same as each other in operation. The first and second semiconductor devices respectively includes first and second channel regions arranged in a surface of the substrate, and first and second gate electrodes disposed on the first and second channel regions via gate insulating films. A relaxing structure is arranged to reduce fluctuations in the properties of the first and second semiconductor devices, the fluctuations being caused by the electrical effects of plasma when a plasma process is performed. The relaxing structure includes first and second short-circuiting elements respectively connected to the first and second wiring layers and equivalent to each other. The first and second short-circuiting elements are configured to short-circuit the first and second gate electrodes with the first and second channel regions, respectively.