The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2004
Filed:
Jul. 05, 2000
Applicant:
Inventor:
Osamu Ogawa, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/900 ; G06F 9/445 ;
U.S. Cl.
CPC ...
G06F 1/900 ; G06F 9/445 ;
Abstract
An apparatus adapted for exposing a semiconductor is controlled by a program using a plurality of parameters. The apparatus has an extraction device that extracts a parameter, from the plurality of parameters, of which a settable range is changed due to an upgrade of the program. An edit device edits a value of an extracted parameter extracted by the extraction device.
Quick Actions:
Ogawa, Osamu. (2004). Semiconductor exposure apparatus and parameter check method (U.S. Patent No. 6711452). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6711452
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