The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6710850 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 23, 2004

Filed:

Dec. 20, 2001
Applicant:
Inventors:

Atsushi Yamaguchi, Tokyo, JP;

Hideaki Sakamoto, Tokyo, JP;

Yasuhiro Honda, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/758 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/758 ;
Abstract

A reticle stage moves while holding the reticle. A stage controller detects the acceleration of the reticle stage based on the results of detection of an laser interference system. A main control system controls movement of the reticle stage so that the acceleration detected by the reticle stage becomes within a predetermined range of acceleration of the reticle stage where offset will not occur in the reticle. An image of the pattern formed on the reticle is transferred to a wafer through a projection optical system while synchronously moving the reticle and the wafer.


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Yamaguchi, Atsushi. (2004). Exposure apparatus and exposure method (U.S. Patent No. 6710850). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6710850

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