The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2004
Filed:
Feb. 09, 2001
Applicant:
Inventor:
Chi-Yu Liao, Taipei, TW;
Assignee:
BenQ Corporation, Tao-Yuan Hsien, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1335 ;
U.S. Cl.
CPC ...
G02F 1/1335 ;
Abstract
A method of performing a uniform illumination pattern in a back-light plate by using a press. This method mainly utilizes a press with a plurality of protruding elements to press an illuminating face of the back-light plate. Accordingly, a plurality of recesses, each with a predetermined depth, are consequently formed to serve as a uniform illumination pattern of the back-light plate. When visible light incidents into the back-light plate, the plurality of recesses on the illuminating face make the back-light plate be uniformly illuminated.