The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 23, 2004

Filed:

Oct. 17, 2002
Applicant:
Inventors:

Jun-Jong Lee, Seoul, KR;

Kyou-Bong Lee, Suwon, KR;

Jong-Han Rhee, Suwon, KR;

Sang-Ho Jeon, Seongnam, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 2/980 ;
U.S. Cl.
CPC ...
H01J 2/980 ;
Abstract

A cathode ray tube includes a panel with an inner phosphor screen, and a funnel sealed to the panel while facing the phosphor screen. The funnel is externally mounted with a deflection yoke. A neck is sealed to the rear of the funnel while mounting an electron gun to emit electron beams therein. A shadow mask is placed within the panel. The shadow mask has a hole-formation portion with a plurality of beam-guide holes, a non-holed portion externally surrounding the hole-formation portion while being shaped with a rectangular frame, and a skirt bent from the outer periphery of the non-holed portion to the rear of the panel. The skirt has a basic etching portion half-etched at a predetermined roughness. The components of the shadow mask are integrated into one body. A welding portion is formed at the bottom of the skirt with a plurality of welding points. A mask frame is internally suspension-fitted to the panel while being welded to the skirt to support the shadow mask. The skirt of the shadow mask has a subsidiary etching portion placed between the welding portion and the basic etching portion while being half-etched at a roughness greater than the roughness of the basic etching portion.


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