The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2004
Filed:
May. 22, 2002
Jyoti Mazumder, Ann Arbor, MI (US);
Timothy Skszek, Saline, MI (US);
Dwight Morgan, Rochester Hills, MI (US);
The P.O.M. Group, Auburn Hills, MI (US);
Abstract
Continuously adjustable focusing optics for use in laser-assisted direct metal deposition (DMD™) processes provide for adaptive deposition width to increase deposition rate while maintaining the dimensional tolerances. The focusing optics and method may be adapted for variable deposition road width under closed-loop feedback, so that complicated features may be fabricated with close tolerance, stress and microstructure control to improve the lead-time and design flexibility. The preferred embodiment uses adaptive mirror arrangements and beam movement for variable deposition width and geometry. Conceptually, an infinite number of mirror arrangements can be made to adapt to a particular deposit shape.