The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2004
Filed:
Jan. 02, 1996
Applicant:
Inventor:
Edward Gratrix, Trumbull, CT (US);
Assignee:
Goodrich Corporation, Charlotte, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03H 1/00 ;
U.S. Cl.
CPC ...
G03H 1/00 ;
Abstract
A substrate surface 10 having a photo-sensitive material surface thereon is simultaneously exposed to four plane waves of light at angles of incidence &thgr;, −&thgr;, &phgr; and −&phgr; subtending from the normal of the surface. The four plane waves create an interference pattern on the substrate so as to cause the formation of a periodic structure on the photo-sensitive material surface of the substrate.
Gratrix, Edward. (2004). Method and apparatus for generating periodic structures in substrates by synthetic wavelength holograph exposure (U.S. Patent No. 6709790). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6709790
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile