The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2004
Filed:
May. 05, 2003
Thomas Carson Tiearney, Jr., Waukesha, WI (US);
Srihari Balasubramanian, Clifton Park, NY (US);
Pazhayannur Ramanathan Subramanian, Niskayuna, NY (US);
Gregory Alan Steinlage, Milwaukee, WI (US);
Mark Ernest Vermilyea, Niskayuna, NY (US);
Liqin Wang, Brookfield, WI (US);
GE Medical Systems Global Technology Company, LLC, Waukesha, WI (US);
Abstract
An X-ray target material comprising an oxide-dispersion strengthened Mo (ODS-Mo) alloy. ODS-Mo refers to molybdenum strengthened by a fine dispersion of insoluble oxide particles of one or more of the following compounds: La O , Y O and CeO . ODS—Mo alloy improves upon the prior art by providing higher and more uniform strength and creep resistance over the applicable temperature range of large brazed graphite targets. This, in conjunction with higher-strength graphite, allows the target to spin faster without causing graphite burst, thus providing improvement in peak power. The recrystallization temperature of the fabricated material is high enough to maintain original properties through all target processing, including a very high-temperature braze cycle.