The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2004
Filed:
Jul. 31, 2002
Kenji Matumoto, Kaisei-machi, JP;
Fuji Photo Film Co., Ltd., Kanagawa-Ken, JP;
Abstract
In a process for producing a semiconductor laser element, a mask having a pair of openings is formed on a current stopping layer formed above a first cladding layer; a pair of first grooves are formed in the current stopping layer by etching using the mask; portions of the first cladding layer located at the bottoms of the pair of first grooves are etched off so as to form a pair of second grooves in the first cladding layer, and a portion of the current stopping layer left between the pair of first grooves are etched off; the pair of second grooves are filled with a material having a refractive index higher than that of the first cladding layer; and a second cladding layer is formed over the pair of second grooves and the region of the first cladding layer located between the pair of second grooves.