Semiconductor memory device having mesh-type structure of precharge voltage line

Abstract

A semiconductor memory device having a mesh-type structure of a precharge voltage line is provided. The semiconductor memory device includes a plurality of memory cell arrays, a plurality of bit line precharge circuit units, and a first precharge voltage line and a second precharge voltage line. Each of the plurality of memory cell arrays include a plurality of memory cells and a plurality of bit line pairs for outputting and receiving data to and from each of the memory cells and are arranged in a matrix. The plurality of bit line precharge circuit units precharge and equalize corresponding bit line pairs of the memory cell arrays into predetermined precharge voltages. The first precharge voltage line and the second precharge voltage line are arranged in a mesh in each region between the plurality of memory cell arrays. During a first mode of operation, the first precharge voltage line and the second precharge voltage line supply a common precharge voltage and during a second precharge voltage line, precharge voltages having different levels are supplied at the first and the second precharge voltage lines to precharge memory cells adjacent to one another with different precharge voltages.