The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2004
Filed:
Jun. 28, 2001
David A. Ansley, Long Beach, CA (US);
Chungte W. Chen, Irvine, CA (US);
Robert W. Byren, Hermosa, CA (US);
Raytheon Company, Waltham, MA (US);
Abstract
An optical system has a light source of an optical beam, and a wavefront distortion generator that introduces a known wavefront distortion into at least one wavelength component of the optical beam prior to the formation of an intermediate image. A focusing device receives the optical beam, produces the intermediate image of the optical beam, and outputs the optical beam. A wavefront distortion corrector, after the formation of the intermediate image, introduces a wavefront distortion correction into each component of the optical beam into which the known wavefront distortion was introduced by the wavefront distortion generator. The wavefront distortion correction is the reverse of the known wavefront distortion introduced into the optical beam by the wavefront distortion generator.