The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2004
Filed:
Sep. 28, 2001
Leroy C. Vargas, New Bedford, MA (US);
Polaroid Corporation, Waltham, MA (US);
Abstract
A system for detecting defects in a layer of dielectric material is disclosed. The disclosed system comprises a first electrode, on which the layer is placed, at least one second electrode oppositely spaced apart from the first electrode and oppositely spaced apart from, but not in contact with, the top surface of the layer. A voltage, that is at least equal to the breakdown voltage corresponding to the spacing between the first and second electrodes in the absence of the material layer, is applied across the first and second electrodes. The presence and characteristics, such as the location and the cross sectional area, of defects are detected as a function of the flow of electrical current from the first electrode to the at least one second electrode.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile