The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2004
Filed:
Aug. 08, 2001
Wen-Chiang Huang, Auburn, AL (US);
Nanotek Instruments, Inc., Fargo, ND (US);
Abstract
A direct-write method for depositing a polarized material of a predetermined computer-aided pattern onto a target surface, the method including the following steps: (1) forming a solution of a material capable of being polarized using a polarization solvent which can be removed by evaporation to provide a polarized material; (2) operating dispensing devices to dispense and deposit the solution onto the target surface substantially point by point and at least partially removing the solvent from the deposited solution to form a thin layer of substantially solidified material of the predetermined pattern; and (3) during the solvent-removing step, operating a high DC voltage for poling the deposited solution to achieve polarization in the material. The invention also provides a freeform fabrication method for building a multi-layer device, such as a micro-electro-mechanical system (MEMS), that exhibits piezoelectric or pyroelectric properties.