The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2004
Filed:
Apr. 26, 2002
Applicant:
Inventors:
Yoichi Inoue, Takasago, JP;
Yoshihiko Sakashita, Takasago, JP;
Katsumi Watanabe, Kobe, JP;
Nobuyuki Kawakami, Kobe, JP;
Takahiko Ishii, Takasago, JP;
Yusuke Muraoka, Kyoto, JP;
Kimitsugu Saito, Kyoto, JP;
Tomomi Iwata, Kyoto, JP;
Ikuo Mizobata, Kyoto, JP;
Takashi Miyake, Kyoto, JP;
Ryuji Kitakado, Kyoto, JP;
Assignee:
Other;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
A method and system for processing a substrate includes performing a wet process by supplying a working liquid to a substrate in a wet processing apparatus, transferring the substrate in a non-dry state from the wet processing apparatus to a drying apparatus, and subjecting the substrate to a supercritical drying by a supercritical fluid in the drying apparatus.