The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2004
Filed:
Sep. 05, 2002
Morio Ogura, Hirakata, JP;
Tatsuro Usuki, Osaka, JP;
Sanyo Electric Co., Ltd., Moriguchi, JP;
Abstract
A substrate coated with a transparent conductive film is manufactured by: disposing a substrate and a target constituted of alloy of In and Sn in a film deposition chamber leading an Ar gas ion beam into the film deposition chamber to cause collision of the ion beam with the target sputtering-emission of constitutive atoms of the target and supply of the emitted atoms to the substrate and leading oxide gas including oxygen radicals as a main element thereof from an ECR radical source into the film deposition chamber to deposit an ITO film on the substrate In this manufacturing method, a film is deposited on a film or substrate including an organic material without damaging the organic material. The deposited film has low resistivity, high transmission and preferable flatness.