The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2004

Filed:

Jan. 11, 2002
Applicant:
Inventors:

Johann Karner, Feldkirch, AT;

Mauro Pedrazzini, Eschen, LI;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/24 ; H05H 1/48 ; C23C 1/414 ; C23C 1/456 ;
U.S. Cl.
CPC ...
H05H 1/24 ; H05H 1/48 ; C23C 1/414 ; C23C 1/456 ;
Abstract

Vacuum treatment installation with a vacuum treatment chamber containing a plasma discharge configuration as well as a gas supply configuration. The plasma discharge configuration has at least two plasma beam discharge configurations with substantially parallel discharge axes and a deposition configuration is positioned along a surface which extends at predetermined distances from the beam axes and along a substantial section of the longitudinal extent of the discharge beam.


Find Patent Forward Citations

Karner, Johann. (2004). Installation and method for vacuum treatment or powder production (U.S. Patent No. 6703081). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6703081

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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