The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2004
Filed:
May. 20, 2002
Applicant:
Inventors:
Leonid E. Reyzelman, Rochester, NY (US);
John E. Sortor, Norristown, PA (US);
Assignee:
ENI Technology, Inc., Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/00 ; C23C 1/600 ; H01L 2/1306 ; H03G 3/00 ;
U.S. Cl.
CPC ...
B05D 1/00 ; C23C 1/600 ; H01L 2/1306 ; H03G 3/00 ;
Abstract
A radio frequency (RF) generator apparatus for a plasma processing system that is resistant to nonlinear load mismatch conditions is provided. The apparatus includes an RF oscillator configured to generate an RF signal, an RF amplifier responsive to the RF signal to produce a VHF RF signal having sufficient power to drive a plasma chamber load, and a VHF-band circulator coupled to the amplifier and configured to isolate nonlinearities of the plasma chamber load from the amplifier.