The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2004
Filed:
Apr. 30, 2001
James P. Batug, Macungie, PA (US);
Carlos E. Romero, Bethlehem, PA (US);
Ali Yilmaz, Worcester, MA (US);
Edward K. Levy, Bethlehem, PA (US);
Noel Moyer, Allentown, PA (US);
PPL Electric Utilities Corp., Allentown, PA (US);
Abstract
An emission measuring system and method provide an accurate, real-time calculation of a particular material emitted from an emission source. Specifically, a CEM system installed in an industrial stack can include a dilution probe located in the stack and a data analyzer that records and analyzes characteristic data of the materials sampled by the dilution probe. A dilution ratio is used to correct for the addition of dilution gas into the stack gas sample to determine the concentration of a particular material that is being emitted from the stack. The dilution ratio is based on a molar flow rate, which can be determined by using specific algorithms and measurements.