The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2004
Filed:
Oct. 31, 2002
Joseph Pellegrini, Jamaica Plain, MA (US);
David Crow, Maple Grove, MN (US);
Inficon LT Inc., Cambridge, MA (US);
Abstract
Methods and systems for controlling critical dimension (CD) in a process system, including computing an exposure dose error based on at least one output of the process system, normalizing the computed exposure dose error based on a target exposure dose, and providing an exposure dose to the process system based on at least one normalized exposure dose error. The target exposure dose can be associated with a process system characteristic(s) and can be updated based on normalized computed exposure dose errors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile