The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2004
Filed:
Aug. 30, 2000
Applicant:
Inventors:
Geun Su Lee, Kyoungki-do, KR;
Hyeong Soo Kim, Kyoungki-do, KR;
Jin Soo Kim, Taejeon-shi, KR;
Cha Won Koh, Seoul, KR;
Sung Eun Hong, Kyoungki-do, KR;
Jae Chang Jung, Kyoungki-do, KR;
Min Ho Jung, Kyoungki-do, KR;
Ki Ho Baik, Kyoungki-do, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 ;
U.S. Cl.
CPC ...
G03F 7/00 ;
Abstract
The present invention provides a method for reducing or eliminating a poor pattern formation on a photoresist film by contacting the photoresist film with an alkaline solution prior to its exposure to light. Methods of the present invention significantly reduce or prevent T-topping and top-loss.