The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2004
Filed:
Mar. 21, 2001
Applicant:
Inventor:
Safwat E. Tadros, Evansville, IN (US);
Assignee:
General Electric Company, Pittsfield, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 4/760 ;
U.S. Cl.
CPC ...
B29C 4/760 ;
Abstract
A method for processing an impact modifier material having a core and shell molecular structure comprises working the impact modifier material in a mild extruder to a state such that at least a portion of the shells of the impact modifier material fuse together to form an impact modifier material output, and pelletizing the impact modifier output. The output is preferably pellitized, and produces pellets having a narrow size distribution.
Quick Actions:
Tadros, Safwat. (2004). Impact modifier material and method and apparatus for the production thereof (U.S. Patent No. 6699416). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6699416
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile