The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2004
Filed:
Apr. 01, 2002
Applicant:
Inventor:
Yong-Soo Kim, Seoul, KR;
Assignee:
Hanyang Hak Won Co., Ltd., Seoul, KR;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C04B 4/191 ; C03C 2/568 ;
U.S. Cl.
CPC ...
C04B 4/191 ; C03C 2/568 ;
Abstract
A process for gas-phase etching of actinide oxides from a substrate by using plasma power comprising the steps of: a) preheating actinide oxides on the substrate within a process chamber filled with fluorine-containing gas and exposing it to plasma power, and subsequently b) etching actinide oxides from the substrate using a plasma gas-phase reactant system.
Quick Actions:
Kim, Yong-Soo. (2004). Effective dry etching process of actinide oxides and their mixed oxides in cf4/o2/n2 plasma (U.S. Patent No. 6699398). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6699398
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile