The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2004
Filed:
Jul. 15, 2002
David C. Winter, Layton, UT (US);
Edward G. van Nimwegen, North Ogden, UT (US);
Coplan E. Vaughan, Syracuse, UT (US);
Lifetime Products, Inc., Clearfield, UT (US);
Abstract
An adjustable basketball goal system allowing for adjustment of the height of a basketball goal above a playing surface. The basketball goal system including a rigid support pole having a first end, a second opposing end, and an intermediate body portion disposed between the first and second ends. A first parallelogrammic structure configured to pivotally engage the first end of the rigid support. A basketball goal attached to the first parallelogrammic structure. The first deformable parallelogrammic structure may be deformed into a plurality of configurations resulting in an adjustment to the height of the basketball goal above the playing surface corresponding to each configuration. A second parallelogrammic structure, which may also be deformed into a plurality of configurations, includes a first end pivotally connected to the first parallelogrammic structure and a second opposing end configured to pivotally engage the rigid support pole. In operation, selective deformation of the second parallelogrammic structure results in selective deformation of the first parallelogrammic structure, thereby adjusting the height of the basketball goal above the playing surface. A locking mechanism may be operably disposed relative to the second parallelogrammic structure. The locking mechanism being positionable between an engaged position wherein the second parallelogrammic structure is restricted from deforming and a disengaged position wherein the second parallelogrammic structure may be freely deformed.