The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6698000 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 24, 2004

Filed:

Nov. 09, 2001
Applicant:
Inventor:

Genichi Tanaka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 1/750 ;
U.S. Cl.
CPC ...
G06F 1/750 ;
Abstract

There is provided a semiconductor process determining method comprising: Step ST of inputting an input parameter from a input part; Step ST of obtaining the delay time of a certain circuit by means of simulation on a gate level by letting the output parameter of each wiring layer be a variable; Step ST of judging whether or not the simulation is completed; Step ST of extracting the output parameter of each wiring layer giving the shortest delay time; and Step ST of outputting the extracted output parameter of each wiring layer in a display part.


Find Patent Forward Citations

Tanaka, Genichi. (2004). Semiconductor process parameter determining method, semiconductor process parameter determining system, and semiconductor process parameter determining program (U.S. Patent No. 6698000). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6698000

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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