The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2004

Filed:

Oct. 12, 2001
Applicant:
Inventors:

Sheng Ma, Briarcliff Manor, NY (US);

Genady Grabarnik, Briarcliff Manor, NY (US);

Joseph L. Hellerstein, Ossining, NY (US);

Chang-Shing Perng, Bedford Hills, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 1/700 ;
U.S. Cl.
CPC ...
G06F 1/700 ;
Abstract

Techniques for mining or discovering one or more patterns in an input data set, wherein the input data set is characterized by attributes, comprises the following steps. First, the technique includes mapping attributes of the input data set to mapping values. Then, one or more candidate patterns are formed as groupings of two mapping values that occur within a predefined time period. Next, for each of the one or more candidate patterns, a qualification function is computed and a result of the qualification function is compared with at least one predefined threshold value. The one or more candidate patterns whose qualification function results are greater than or equal to the predefined threshold value are identified as one or more qualified patterns.


Find Patent Forward Citations

Ma, Sheng. (2004). Systems and methods for pairwise analysis of event data (U.S. Patent No. 6697802). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6697802

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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