The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2004
Filed:
Apr. 02, 2002
Nobuhiko Ogura, Kaisei-machi, JP;
Nobufumi Mori, Kaisei-machi, JP;
Katsumi Hayashi, Kaisei-machi, JP;
Toshihito Kimura, Kaisei-machi, JP;
Fuji Photo Film Co., Ltd., Kanagawa-ken, JP;
Abstract
Disclosed herein is a measuring apparatus utilizing attenuated total reflection. The measuring apparatus is equipped with a dielectric block, a thin film layer formed on one surface of the dielectric block, an optical system for making a light beam enter the dielectric block so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer, and a two-piece photodiode for detecting the light beam totally reflected at the interface. When attenuated total reflection is detected a plurality of times for a single sample, the two-piece photodiode is disposed at a predetermined position relative to a dark line when a first measurement is made. The two-piece photodiode is also disposed at the same position as the predetermined position stored in a storage unit when a second measurement and measurements thereafter are made.