The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2004

Filed:

May. 14, 2001
Applicant:
Inventors:

Masahiro Katsumura, Tsurugashima, JP;

Tetsuya Iida, Tsurugashima, JP;

Takashi Ueno, Tokyo-to, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 1/100 ;
U.S. Cl.
CPC ...
B29D 1/100 ;
Abstract

The present invention is to provide a production method for an optical disc, capable of obtaining a good S/N ratio without deterioration of the stamper quality due to reaction with an electron attractive group contained in a resist material. The processes of forming a resist film on a substrate, patterning the resist film on the substrate by an electron beam cutting, forming a nickel alloy thin film on the patterned resist film, forming a nickel layer on the nickel alloy thin film by the electrocasting, and injection molding of a resin, using the nickel layer peeled off from the nickel alloy thin film as a stamper, are provided. The nickel alloy thin film has a composition containing Ni element as the main component as well as Ru element by less than 25% by weight.


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