The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2004
Filed:
Mar. 01, 2000
Applicant:
Inventors:
Assignee:
Nippon Shokubai Co., Ltd., Osaka, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 ;
U.S. Cl.
CPC ...
B08B 3/00 ;
Abstract
A method for the production of (meth)acrylic acid and/or a (meth)acrylic ester is provided. This method for the production of (meth)acrylic acid and/or a (meth)acrylic ester includes washing the device constructed for the production thereof with a basic solution and subsequently rinsing them with a solvent for the purpose of removing solid substances such as polymer and precipitate which occur during the production of (meth)acrylic acid and/or a (meth)acrylic ester.
Quick Actions:
Nakahara, Sei. (2004). Method for production of (meth) acrylic acid and/or (meth)acrylic esters (U.S. Patent No. 6695928). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6695928
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile