The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2004
Filed:
Jul. 15, 1998
Jung-Chieh Su, Hsin-Chu, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A process for fabricating micro-mirrors on a silicon substrate is disclosed, which can markedly improve the flatness of micro-mirrors, reduce the scattering of incident light, and increase S/N ratio. The fabrication process comprises the steps of: forming micro-planes along a certain direction on a silicon substrate to serve as mirrors; forming a SiO layer on the silicon substrate; and melting the SiO layer on the micro-planes by a heating process and then crystallizing SiO again to form micro-mirrors. Further, instead of coating the SiO layer, a metal layer can be used to form a eutectic structure with the silicon substrate. After the micro-mirrors are formed, a layer of Au can be coated thereon to increase the reflectance of the micro-mirrors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile