The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2004
Filed:
Oct. 30, 2001
Applicant:
Inventors:
Ring-Ling Chien, San Jose, CA (US);
Benjamin N. Wang, Palo Alto, CA (US);
Assignee:
Caliper Technologies Corp., Mountain View, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 7/06 ; B01D 1/508 ;
U.S. Cl.
CPC ...
G05D 7/06 ; B01D 1/508 ;
Abstract
Methods of concentrating materials within microfluidic channel networks by moving materials into regions in which overall velocities of the material are reduced, resulting in stacking of the material within those reduced velocity regions. These methods, devices and systems employ static fluid interfaces to generate the differential velocities, as well as counter-current flow methods, to concentrate materials within microscale channels.