The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 17, 2004

Filed:

Feb. 22, 2002
Applicant:
Inventors:

Gerhard Weiss, Weyhe, DE;

Jochen Franzen, Bremen, DE;

Assignee:

Bruker-Daltonik GmbH, Bremen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 4/904 ;
U.S. Cl.
CPC ...
H01J 4/904 ;
Abstract

The invention relates to a device and a method for producing, from any previously configured ion beams, precisely localized small packages of ions which all fly at the same velocity. The invention consists of damping the ions in a damping-gas filled series of apertured diaphragms (which are firstly subjected alternately to the two phases of an RF voltage and secondly to a multiphase low-frequency travelling field voltage) into the axis of the apertured diaphragm arrangement and packaging the ions in bundles which are propelled axially at the same velocity for ions of different specific masses. These ion packages, which are restricted both in an axial and a radial direction, can be used to advantage for injection into different types of mass spectrometer, both storage ion-trap mass spectrometers, such as cyclotron resonance mass spectrometers or quadrupole ion traps and, especially, for time-of-flight mass spectrometers with orthogonal injection. The arrangement of a damping-gas filled series of apertured diaphragms can also be used for ion fragmentation.


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