The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2004
Filed:
Jun. 12, 2001
Applicant:
Inventors:
Jae Chang Jung, Kyoungki-do, KR;
Geun Su Lee, Kyoungki-do, KR;
Min Ho Jung, Kyoungki-do, KR;
Ki Ho Baik, Kyoungki-do, KR;
Assignee:
Hynix Semiconductor Inc, Kyoungki, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 ; G03F 7/039 ; G03F 7/32 ; G03F 7/38 ; G03F 7/40 ;
U.S. Cl.
CPC ...
G03F 7/038 ; G03F 7/039 ; G03F 7/32 ; G03F 7/38 ; G03F 7/40 ;
Abstract
The present invention relates to a photoresist composition containing a photo radical generator, more specifically, to a photoresist composition which comprises (a) photoresist resin, (b) a photoacid generator, (c) an organic solvent and (d) a photo radical generator. The present photoresist composition reduces or prevents a sloping pattern formation due to a higher concentration of acid in the upper portion of the photoresist relative to the lower portion of the photoresist.