The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2004
Filed:
Oct. 17, 2001
Applicant:
Inventor:
Yasuhisa Yamada, Tokyo, JP;
Assignee:
NEC Electronics Corporation, Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
In a mask for beam exposure, a membrane structure for endless patterns and a stencil structure for terminated patterns are provided in combination.
Yamada, Yasuhisa. (2004). Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same (U.S. Patent No. 6692877). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6692877
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile