The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
Jul. 02, 2001
Lee Weng, Bellevue, WA (US);
Hongyue Dai, Bothell, WA (US);
Rosetta Inpharmatics LLC, Kirkland, WA (US);
Abstract
The invention provides methods for generating differential profiles having been subject to condition A vs. condition B (A vs. B) from data obtained in separately performed experimental measurements A vs. C and B vs. D. When C and D are the same, the invention provides methods for determination of systematic measurement errors or biases between different measurements carried out in different experimental reactions, i.e., cross-experiment errors or biases, using data measured for samples under the common condition and for removal or reduction of such cross-experiment errors. The invention further provides methods for generating differential profiles A vs. B from data obtained in single-channel measurements A and B.