The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
Jul. 15, 2002
Applicant:
Inventors:
Nobuyuki Kasama, Chiba, JP;
Manabu Oumi, Chiba, JP;
Yasuyuki Mitsuoka, Chiba, JP;
Kenji Kato, Chiba, JP;
Hidetaka Maeda, Chiba, JP;
Takashi Niwa, Chiba, JP;
Yoko Shinohara, Chiba, JP;
Assignee:
Seiko Instruments Inc., Chiba, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 ;
U.S. Cl.
CPC ...
G03F 7/00 ;
Abstract
A method of fabricating a near-field light-generating element having a minute scattering body inside an aperture, the scattering body producing plasmons by being illuminated with light, includes a step of forming minute scattering bodies periodically arranged on a substrate, a step of selecting the periodically arranged minute scattering bodies except for only one minute scattering body, and a step of forming the aperture such that the single minute scattering body is placed inside the aperture.