The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
Apr. 17, 2001
Gilbert D. Feke, Southbridge, MA (US);
Robert D. Grober, Milford, CT (US);
Yale University, New Haven, CT (US);
Abstract
A method of imaging acid in a chemically amplified photoresist comprising the steps of: (a) exposing the chemically amplified photoresist to radiation thereby generating an acid, the chemically amplified photoresist comprising at least one species of pH-dependent fluorophore that fluoresces in the presence of the acid, the pH-dependent fluorophore being present at a concentration that enables the fluorescence from individual molecules of the pH-dependent fluorophore to be individually resolved; and (b) generating an image of the acid in the photoresist, the image comprising at least one or a plurality of discrete points corresponding to the fluorescent emission from an individual molecule or molecules of the pH-dependent fluorophore.