The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
Mar. 15, 2002
Applicant:
Inventor:
Greg Goodwin, Austin, TX (US);
Assignee:
Advanced Micro Devices, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/36 ; G03F 7/40 ; B08B 6/00 ; C25F 1/00 ; H01L 2/106 ;
U.S. Cl.
CPC ...
G03F 7/36 ; G03F 7/40 ; B08B 6/00 ; C25F 1/00 ; H01L 2/106 ;
Abstract
The present invention provides for a method and an apparatus for controlling plasma photoresist removal processes. At least one manufacturing run of semiconductor devices is processed. Environmental data is acquired in response to processing the semiconductor devices. Metrology data is acquired in response to processing the semiconductor devices. The method further comprises performing residual gas analysis based upon the acquired environmental data and the acquired metrology data.
Goodwin, Greg. (2004). Method and apparatus for control of photoresist plasma removal (U.S. Patent No. 6689521). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6689521
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile