The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
Mar. 26, 2001
Applicant:
Inventors:
Kazuhiro Hattori, Tokyo, JP;
Kenji Uchiyama, Tokyo, JP;
Assignee:
TDK Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 ; B32B 9/00 ; B44C 1/22 ;
U.S. Cl.
CPC ...
C23F 1/00 ; B32B 9/00 ; B44C 1/22 ;
Abstract
A dry etching is performed using a mask made of a titanium nitride under a reaction gas of a carbon monoxide with an additive of a nitrogen containing compound gas.
Hattori, Kazuhiro. (2004). Dry etching method, microfabrication process and dry etching mask (U.S. Patent No. 6689283). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6689283
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile