The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
Jun. 20, 2002
Marc Henri Carolina Anthonis, Hofstade, BE;
Anton-Jan Bons, Kessel-Lo, BE;
Harry William Deckman, Clinton, NJ (US);
Jonas Hedlund, Luleå, SE;
Wenyih F. Lai, Bridgewater, NJ (US);
Jacobus Anna Josephus Peters, Alkmaar, NL;
Other;
Abstract
A process is described for the manufacture of crystalline molecular sieve layers with good para-xylene over meta-xylene selectivity's good para-xylene permeances and selectivities. The process requires impregnation of the support prior to hydrothermal synthesis using the seeded method and may be undertaken with pre-impregnation masking. The crystalline molecular sieve layer has a selectivity (&agr; ) for para-xylene over meta-xylene of 2 or greater and a permeance (Q ) for para-xylene of 3.27×10 mole(px)/m .s.Pa(px) or greater measured at a temperature of ≧250° C. and an aromatic hydrocarbon partial pressure of ≧10×10 Pa.