The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2004
Filed:
Jun. 28, 2002
Simon Thibault, Sainte Foy, CA;
Institut National D'Optique, Sante-Foy, CA;
Abstract
An apparatus for generating linear patterns of light comprises a light source emitting a first light beam. An anamorphic system is positioned downstream of the light source and is adapted to receive the first light beam of the light source for concentrating the first light beam such that the first light beam would project a first linear pattern on a far field. A diffractive optical element is positioned downstream of the anamorphic system for receiving and diffusing the first light beam of the anamorphic system a plurality of second light beams. The plurality of second light beams overlap one another at least partially so as to project a second linear pattern on the far field of altered intensity with respect to the first linear pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile