The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2004
Filed:
Nov. 30, 2001
Nariaki Hamamoto, Kyoto, JP;
Shigeki Sakai, Kyoto, JP;
Nissin Electric Co., Ltd., Kyoto, JP;
Abstract
An ion beam irradiation apparatus is provided with a plasma production device which produces a plasma through the radio frequency discharge and supplies the produced plasma in the vicinity of the substrate The plasma production device includes a plasma producing chamber being elongated along an axis extending in scanning directions X in which the ion beam is moved; a plasma emission hole being provided in a side thereof and elongated along the axis of the plasma producing chamber; and a magnet provided outside the plasma producing chamber for producing a magnetic field having a direction along the axis The magnetic field developed by the magnet contains a magnetic field which has a direction along the axis and bends to the substrate ions contained in the plasma emitted from a plasma emission hole